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標題: CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管? [打印本頁]

作者: scy8080    時間: 2012-2-3 02:59 PM
標題: CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管?
CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管?
作者: hoodlum    時間: 2012-2-3 10:59 PM
小弟的看法是
3 Y) J7 E  ]" j! b會不會是標準CMOS的製程裡
4 \; o3 Y; M1 I9 _) B無法做出二極體, 只能用寄生的
+ m( {8 S. o$ r' Rvertical PNP呢???
作者: leo911759    時間: 2012-2-8 04:02 PM
其實也是有的。) Q: |' B8 ~" r: ~! |4 j
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有一些Paper就是用Diode,或是NPN。
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而會用PNP 是因為早期CMOS製程中,只能寄生等效PNP電路。
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0 ~) S0 F5 U0 @, L2 n. w2 R' l其中的寄生等效Diode會有Latch-up的問題。
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$ E! u( [1 J. ^+ }& _  W這是製程受限的關係,比較先進的製程就沒這種問題了。
作者: patrick02046    時間: 2012-2-9 01:24 PM
在EDA Board 抓的資訊, 參考一下:. O: B" s9 |" G! d) f

1 J5 d3 n+ a# o6 a, V- ^I believe that what you are getting at is that there is a specific structure of P+/Nwell/Psub that is used for " \( Z; P& t4 H# l0 F8 t* {8 n3 p

; p! ]; ^" R2 f- {+ xthe "bipolar", so you are asking why use that structure rather than simply a P+/Nwell "diode". Here is my take   n1 j; @. [' Z8 y0 l
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on this:/ P2 H3 i$ i. s4 N# T" Q

: V, p, G0 W  f! ^# X/ v1- The "bipolar" will simulate more accurately than the "diode", since it will include the substrate current - h4 B7 j2 ?% `' j1 a

: L% o4 O, Q* [that is probably not modeled for the "diode".
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% c( u3 x2 W7 f/ Y2- There usually is a specific structure for the "bipolar" that has characterization data available. When
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3 ]! c. f0 i7 b7 g, w! R6 ~6 P! Wbuilding a bandgap structure, the good characterization is needed in order to properly determine the tempco of
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0 @7 i: S/ ^6 E$ n$ S( F8 c6 Lthe Base-emitter voltage.
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6 [+ u) ]5 n  ?8 c3- The additional structure of the bipolar should help prevent current injection into other substrate tied
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+ @" M' t) N8 D3 t- V6 k9 Ndevices.% S! D7 c: ^- Q: N
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- c5 A* r2 O, R5 U3 X  i; b5 L6 K; tThere is, of course, nothing preventing the use of a P+/Nwell diode in your application.
作者: luckyhuihui666    時間: 2012-4-13 08:06 PM
主要原因就是二极管不准确……




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