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標題: CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管? [打印本頁]

作者: scy8080    時間: 2012-2-3 02:59 PM
標題: CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管?
CMOS工艺下bandgap 负温度系数器件,为什么使用PNP管而不是用二极管?
作者: hoodlum    時間: 2012-2-3 10:59 PM
小弟的看法是
* k( c" N7 w$ J/ \9 l* C) K8 S8 ^; C1 l會不會是標準CMOS的製程裡; d! E6 R1 X0 T$ ^2 P
無法做出二極體, 只能用寄生的: T5 F! n( O/ g  D7 b
vertical PNP呢???
作者: leo911759    時間: 2012-2-8 04:02 PM
其實也是有的。' g. |, _; O- ?2 ?5 o

) a- p: e% M/ v0 L; g  R# v$ s有一些Paper就是用Diode,或是NPN。
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而會用PNP 是因為早期CMOS製程中,只能寄生等效PNP電路。
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其中的寄生等效Diode會有Latch-up的問題。
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這是製程受限的關係,比較先進的製程就沒這種問題了。
作者: patrick02046    時間: 2012-2-9 01:24 PM
在EDA Board 抓的資訊, 參考一下:
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I believe that what you are getting at is that there is a specific structure of P+/Nwell/Psub that is used for 2 Y3 R" e% t/ k, w* B! E4 ]
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the "bipolar", so you are asking why use that structure rather than simply a P+/Nwell "diode". Here is my take
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on this:" D1 G) l& _" M5 F% i' C. Q

' T9 g7 ]. [3 s; h* f* _- Q6 U7 Q1- The "bipolar" will simulate more accurately than the "diode", since it will include the substrate current
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that is probably not modeled for the "diode".8 c2 X+ k9 F( g6 P
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2- There usually is a specific structure for the "bipolar" that has characterization data available. When
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1 @& Y4 d" f8 Jbuilding a bandgap structure, the good characterization is needed in order to properly determine the tempco of * T9 z" B$ w9 j; z% d7 t4 T1 u
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the Base-emitter voltage.
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3- The additional structure of the bipolar should help prevent current injection into other substrate tied
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9 a/ Z9 z8 d& dThere is, of course, nothing preventing the use of a P+/Nwell diode in your application.
作者: luckyhuihui666    時間: 2012-4-13 08:06 PM
主要原因就是二极管不准确……




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